CVD hard coating Ti(C,N): through-process modeling and its experimental verification

Yong Du, Central South University (CSU), Changsha, China

In this work, the influence of temperature, pressure, and gas concentration on the chemical compositions, phases and deposition rates of MTCVD (Moderate Temperature Chemical Vapor Deposition) Ti(C,N) coatings are investigated by the integration of thermodynamic calculations and computational fluid dynamics (CFD) simulations with key experiments. The thermodynamic calculations predict that higher deposition temperature leads to higher C and N contents but lower Ti content under constant gas concentration and pressure. CFD simulation indicates that the deposition rate decreases from inside to outside on the same graphite tray. The deposition rate of the upper trays is higher than that of the lower ones at the outside location of trays. MTCVD Ti(CN) coatings were deposited at three different temperatures to verify the chemical compositions and deposition rates predicted by thermodynamic calculations and CFD simulations, respectively.

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Session T1: Tuesday, 26 June 2018

Start: 10:00 a.m.
End: 10:15 a.m.